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978-3-8439-1450-5, Reihe Ingenieurwissenschaften

Richard Wagner
Gas Phase Synthesis of Silicon Nanoparticles for Application in Printable Electronics

201 Seiten, Dissertation Universität Erlangen-Nürnberg (2013), Softcover, A5

Zusammenfassung / Abstract

The synthesis of well-defined silicon nanoparticles via gas phase processing for application in printable electronics is investigated in this thesis. Two hot wall reactors, which were successfully constructed, characterized and operated, are initially introduced. In the following it will be demonstrated how spherical silicon nanoparticles with very narrow particle size distribution can be synthesized with these reactors which is very uncommon for gas phase processes. Thus, a central aspect of this study is the clarification of the underlying particle formation mechanism. This formation mechanism will be analyzed by experimental as well as by theoretical investigations and finally elucidated. Subsequently, the results of a systematic process parameter study will be presented to highlight the influence on particle characteristics like size, particle size distribution and shape. Furthermore, the dependence of particle properties like crystallinity, chemical composition of the surface and defect structure on the global process parameters will be investigated. Freshly synthesized silicon nanoparticles exhibit a highly reactive surface, which has to be considered for further post-processing. Therefore, the suitability of various chemical compounds for surface functionalization / passivation will be examined by the use of a two-stage hot wall reactor. Finally, the successful application of the synthesized material for a thin film transistor fabricated by a solution-based approach will be demonstrated. This has not been shown before for silicon nanoparticles synthesized by a hot wall reactor process.